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Chemical manufacturing companies need a means of keeping track of their emissions, as operations within this industry produce a wide variety of gases. These gases include ammonia (NH3), carbon monoxide (CO), carbon dioxide (CO2), hydrogen fluoride (HF), hydrogen chloride (HCl) and hydrogen cyanide (HCN). Gas monitoring equipment used in chemical manufacturing facilities must have the sensitivity to detect and accurately measure individual gases within effluent.


Our continuous emissions monitoring instruments are capable of precise measurement of many different gas species. Multichannel LasIR models are the most commonly used analyzers as they allow for gas measurment at up to 16 different locations within a plant--this is achieved using a single controller connected to any combination of stacks, inlet ducts and open path telescopes. The wide dynamic range at which LasIR systems operate allows for the use of the same controller to monitor the target gas or gases, which may be present at significantly different concentrations.

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