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The semiconductor industry makes wide use of hydrogen fluoride (HF) in production, especially for the etching process. Hydrogen fluoride gas is used in very high concentrations, and knowing its exact concentration during processing can help significantly with optimization. We have developed a LasIR monitoring system specially dedicated to this gas; it allows for precise and rapid measurement of HF, the concentration of which can easily reach levels of a few percent. Monitoring HF at such high levels without employing any kind of dilutions can make a significant difference in this application.


This industry also needs to measure HF concentrations at low ppb levels. If combined with the proper optical configuration, LasIR analyzers can meet this requirement to provide precise measurements of HF.

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